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Electrical and Electronics

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Electrical Engineering Faculty Publications

1995

Articles 1 - 3 of 3

Full-Text Articles in Engineering

Extreme Ultraviolet Polarizing Optics Using Bare And Aluminum-Coated Silicon Carbide, R. M.A. Azzam, A. M. Kan’An Oct 1995

Extreme Ultraviolet Polarizing Optics Using Bare And Aluminum-Coated Silicon Carbide, R. M.A. Azzam, A. M. Kan’An

Electrical Engineering Faculty Publications

A deformable three-reflection system that uses a bare silicon carbide substrate can function as an in-line, high-throughput (>30%), 90° phase shifter in the 50–100 nm spectral range. For a given extreme ultraviolet wavelength, an aluminum thin film can be deposited on the silicon carbide substrate to suppress the parallel (p) or perpendicular (s) polarization on single reflection or to introduce quarter-wave retardation and equal reflectances for incident p- and s-polarized light.


Single-Layer-Coated Surfaces With Linearized Reflectance Versus Angle Of Incidence: Application To Passive And Active Silicon Rotation Sensors, R. M.A. Azzam, M. M. K. Howlader, T. Y. Georgiou Aug 1995

Single-Layer-Coated Surfaces With Linearized Reflectance Versus Angle Of Incidence: Application To Passive And Active Silicon Rotation Sensors, R. M.A. Azzam, M. M. K. Howlader, T. Y. Georgiou

Electrical Engineering Faculty Publications

A transparent or absorbing substrate can be coated with a transparent thin film to produce a linear reflectanceversus- angle-of-incidence response over a certain range of angles. Linearization at and near normal incidence is a special case that leads to a maximally flat response for p-polarized, s-polarized, or unpolarized light. For midrange and high-range linearization with moderate and high slopes, respectively, the best results are obtained when the incident light is s polarized. Application to a Si substrate that is coated with a SiO2 film leads to novel passive and active reflection rotation sensors. Experimental results and an error analysis …


Maximum Rate Of Change Of The Differential Reflection Phase Shift With Respect To The Angle Of Incidence For Light Reflection At The Surface Of An Absorbing Medium: Èrratum, R. M.A. Azzam, A. M. El-Saba Jan 1995

Maximum Rate Of Change Of The Differential Reflection Phase Shift With Respect To The Angle Of Incidence For Light Reflection At The Surface Of An Absorbing Medium: Èrratum, R. M.A. Azzam, A. M. El-Saba

Electrical Engineering Faculty Publications

No abstract provided.