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Full-Text Articles in Engineering
Linear-Quadratic Control Of A Mems Micromirror Using Kalman Filtering, Jamie P. Schnapp
Linear-Quadratic Control Of A Mems Micromirror Using Kalman Filtering, Jamie P. Schnapp
Theses and Dissertations
The deflection limitations of electrostatic flexure-beam actuators are well known. Specifically, as the beam is actuated and the gap traversed, the restoring force necessary for equilibrium increases proportionally with the displacement to first order, while the electrostatic actuating force increases with the inverse square of the gap. Equilibrium, and thus stable open-loop voltage control, ceases at one-third the total gap distance, leading to actuator snap-in. A Kalman Filter is designed with an appropriately complex state dynamics model to accurately estimate actuator deflection given voltage input and capacitance measurements, which are then used by a Linear Quadratic controller to generate a …
Novel Microelectromechanical Systems Image Reversal Fabrication Process Based On Robust Su-8 Masking Layers, Scott A. Ostrow Ii, Ronald A. Coutu Jr.
Novel Microelectromechanical Systems Image Reversal Fabrication Process Based On Robust Su-8 Masking Layers, Scott A. Ostrow Ii, Ronald A. Coutu Jr.
Electrical and Computer Engineering Faculty Research and Publications
This paper discusses a novel fabrication process that uses a combination of negative and positive photoresists with positive tone photomasks, resulting in masking layers suitable for bulk micromachining high-aspect ratio microelectromechanical systems (MEMS) devices. MicroChem's negative photoresist Nano™ SU-8 and Clariant's image reversal photoresist AZ 5214E are utilized, along with a barrier layer, to effectively convert a positive photomask into a negative image. This technique utilizes standard photolithography chemicals, equipment, and processes, and opens the door for creating complementary MEMS structures without added fabrication delay and cost. Furthermore, the SU-8 masking layer is robust enough to withstand aggressive etch chemistries …