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Electrical and Computer Engineering

1999

Thin films

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Full-Text Articles in Engineering

Réalisation De Couches Minces De Cualse² Par Recuit De Feuilllets Superposés Cu/Al/Se/Al…, Étude De Conditions De Dépôt, C.O. El Moctar, S. Marsillac, J. C. Bernede, A. Conan, K. Benchouk, A. Khelil Jan 1999

Réalisation De Couches Minces De Cualse² Par Recuit De Feuilllets Superposés Cu/Al/Se/Al…, Étude De Conditions De Dépôt, C.O. El Moctar, S. Marsillac, J. C. Bernede, A. Conan, K. Benchouk, A. Khelil

Electrical & Computer Engineering Faculty Publications

Thin layers of Cu/Al/Se/Al/Cu/Al/Se/…/Al/Se sequentially deposited have been annealed half an hour at 855 K. CuAlSe2 thin films crystallized in the chalcopyrite structure are obtained. The films being contaminated by oxygen, the experimental deposition conditions of the aluminum layer have been improved in order to decrease the atomic concentration of oxygen below 5 at%. Such results can be obtained in vacuum of 10-4 Pa, when the aluminum deposition rate is 1 nm/s and when the layer is immediately covered after deposition. Films obtained in such a way are nearly stoichiometric with lattice parameters in accordance with the expected …