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Full-Text Articles in Engineering
Computational Model Of One-Dimensional Dielectric Barrier Discharges, Krista G. Marchand
Computational Model Of One-Dimensional Dielectric Barrier Discharges, Krista G. Marchand
Theses and Dissertations
As theory lags experiment for dielectric barrier discharge flow control, two different computational methods are implemented to give further insight into characteristics of the dielectric barrier discharge (DBD). A one-dimensional fluid model of a surface-type dielectric barrier discharge is created using He as the background gas. This simple model, which only considers ionizing collisions and recombination in the electropositive gas, creates an important framework for future studies into the origin of experimentally observed flow-control effects of the DBD. The two methods employed in this study include the semi-implicit sequential algorithm and the fully implicit simultaneous algorithm. The first involves consecutive …
Low Dielectric Constant Fluorocarbon Films Containing Silicon By Plasma Enhanced Chemical Vapor Deposition, Yoonyoung Jin
Low Dielectric Constant Fluorocarbon Films Containing Silicon By Plasma Enhanced Chemical Vapor Deposition, Yoonyoung Jin
LSU Doctoral Dissertations
Use of low relative dielectric constant (low-k) material as an interlayer dielectric is among important approaches to reduce the RC time delay in high performance ultra-large-scale integrated circuits. Copper metallization is another approach besides the use of low-k material, in reducing the RC delay time, because of its well-known characteristics of low resistivity and high electromigration resistance. Fluorocarbon films containing silicon (SiCF) have been developed in this work for low-k interlayer dielectric applications below 50 nm linewidth technology. The films were prepared by plasma enhanced chemical vapor deposition (PECVD) using gas precursors of tetrafluoromethane as the source of active species …