Engineering Commons^™

Improvement Of Silicon Oxide Quality Using Heat Treatment, Lei Han

Theses and Dissertations--Electrical and Computer Engineering

In decades, the tremendous development of integrated circuits industry could be mostly attributed to SiO2, since its satisfactory properties as a gate dielectric candidate. The effectivity of SiO2 has been challenged since dielectric layer was scaled down below 3nm, when the gate leakage current of SiO2 became unacceptable. Institution to silicon-based CMOS techniques were proposed, but they have their own limitations. Nowadays, materials with high dielectric constants are mainstream gate dielectric materials in industry, but a SiO2 interfacial layer is still necessary to avoid gap between gate dielectric layer and Si substrate, and to minimize interface trap charges. In this …