Open Access. Powered by Scholars. Published by Universities.®

Engineering Commons

Open Access. Powered by Scholars. Published by Universities.®

Chemical Engineering

Missouri University of Science and Technology

Oxidation

Publication Year

Articles 1 - 3 of 3

Full-Text Articles in Engineering

Atomic Layer Deposited Pt/Tio2-Sio2 And Pt/Zro2-Sio2 For Sequential Adsorption And Oxidation Of Vocs, Busuyi O. Adebayo, Han Yu, Ali A. Rownaghi, Xinhua Liang, Fateme Rezaei Sep 2022

Atomic Layer Deposited Pt/Tio2-Sio2 And Pt/Zro2-Sio2 For Sequential Adsorption And Oxidation Of Vocs, Busuyi O. Adebayo, Han Yu, Ali A. Rownaghi, Xinhua Liang, Fateme Rezaei

Chemical and Biochemical Engineering Faculty Research & Creative Works

In this work, Pt nanoparticles were loaded on SiO2, TiO2-thin-film-modified SiO2 (TiO2-SiO2), or ZrO2-thin-film-modified SiO2 (ZrO2-SiO2) particles and the composites were investigated for sequential adsorption and desorption/catalytic oxidation of benzene. The SiO2 was prepared via sol–gel method, while TiO2-SiO2 and ZrO2-SiO2 were synthesized via atomic layer deposition (ALD) thin film coating of TiO2 or ZrO2 on SiO2 particles substrate. In the sequential capture-reaction tests, the materials were first exposed to ca. 500 ppmv benzene …


Supercritical-Carbon Dioxide-Assisted Cyclic Deposition Of Metal Oxide And Metal Thin Films, Dipak Barua, Theodosia Gougousi, Erin D. Young, Gregory N. Parsons Feb 2006

Supercritical-Carbon Dioxide-Assisted Cyclic Deposition Of Metal Oxide And Metal Thin Films, Dipak Barua, Theodosia Gougousi, Erin D. Young, Gregory N. Parsons

Chemical and Biochemical Engineering Faculty Research & Creative Works

Thin films of aluminum oxide and palladium were deposited on silicon at low temperatures (70-120 °C) by a cyclic adsorption/reaction processes using supercritical CO2 solvent. Precursors included Al(hfac)3, Al(acac)3, and Pd(hfac)2, and aqueous H2O2, tert-butyl peracetate, and H2 were used as the oxidants or reductants. For the precursors studied, growth proceeds through a multilayer precursor adsorption in each deposition cycle, and film thickness increased linearly with the number of growth cycles.


Inherently Safer Analysis Of The Attainable Region Process For The Adiabatic Oxidation Of Sulfur Dioxide, Neil L. Book, Venkata U.B. Challagulla Jul 2000

Inherently Safer Analysis Of The Attainable Region Process For The Adiabatic Oxidation Of Sulfur Dioxide, Neil L. Book, Venkata U.B. Challagulla

Chemical and Biochemical Engineering Faculty Research & Creative Works

The attainable region (AR) method is used to obtain the optimal design and operating conditions for the adiabatic oxidation of sulfur dioxide to sulfur trioxide. The optimum process layout for this exothermic, catalytic, reversible reaction is a complex interconnection of reactors that achieves a conversion in excess of the equilibrium value for a single adiabatic reactor. The complex design obtained from the AR method is technically and economically superior to a single adiabatic reactor, but it is inferior from a safety perspective as a result of its complex interconnections and its high preheat temperature. The strategies of inherently safer design …