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Articles 31 - 34 of 34
Full-Text Articles in Entire DC Network
Spin Relaxation In A Germanium Nanowire, S. Patibandla, S. Pramanik, S. Bandyopadhyay, G. C. Tepper
Spin Relaxation In A Germanium Nanowire, S. Patibandla, S. Pramanik, S. Bandyopadhyay, G. C. Tepper
Electrical and Computer Engineering Publications
We report experimental study of spin transport in nanowirespin valve structures consisting of three layers—cobalt, germanium, and nickel. The spin diffusion length in the Ge is estimated to be about 400nm at 1.9K and the corresponding spin relaxation time is about 4ns. At 100K, the spin diffusion length drops to 180nm and the relaxation time is about 0.81ns. These short relaxation times, which depend weakly on temperature, are caused by strong surface roughness scattering that causes rapid spin relaxation via the Elliott-Yafet mode [Elliott, Phys. Rev.96, 266 (1954)].
Normal And Inverse Spin-Valve Effect In Organic Semiconductor Nanowires And The Background Monotonic Magnetoresistance, Sandipan Pramanik, Supriyo Bandyopadhyay, Kalyan Garre, Marc Cahay
Normal And Inverse Spin-Valve Effect In Organic Semiconductor Nanowires And The Background Monotonic Magnetoresistance, Sandipan Pramanik, Supriyo Bandyopadhyay, Kalyan Garre, Marc Cahay
Electrical and Computer Engineering Publications
We have observed both peaks and troughs in the magnetoresistance of organic nanowires consisting of three layers—cobalt, 8-hydroxy-quinolinolato aluminum (Alq3), and nickel. They always occur between the coercive fields of the ferromagnetic layers, and we attribute them to the normal and inverse spin-valve effect. The latter is caused by resonant tunneling through localized impurity states in the organic material. Peaks are always found to be accompanied by a positive monotonic background magnetoresistance, while troughs are accompanied by a negative monotonic background magnetoresistance. This curious correlation suggests that the background magnetoresistance, whose origin has hitherto remained unexplained, is probably caused by …
Surface Band Bending Of A-Plane Gan Studied By Scanning Kelvin Probe Microscopy, S. A. Chevtchenko, X. Ni, Q. Fan, A. A. Baski, Hadis Morkoç
Surface Band Bending Of A-Plane Gan Studied By Scanning Kelvin Probe Microscopy, S. A. Chevtchenko, X. Ni, Q. Fan, A. A. Baski, Hadis Morkoç
Electrical and Computer Engineering Publications
We report the value of surface band bending for undoped, a-plane GaN layers grown on r-plane sapphire by metalorganic vapor phase epitaxy. The surface potential was measured directly by ambient scanning Kelvin probe microscopy. The upward surface band bending of GaN films grown in the [112¯0] direction was found to be 1.1±0.1V. Because polarization effects are not present on a-plane GaN, we attribute such band bending to the presence of charged surface states. We have modeled the surface band bending assuming a localized level of surface states in the band gap on the surface. It should be noted that the …
Integrating Schedulability Analysis With Uml-Rt, Qimin Gao, Lyndon Brown, Luiz Fernando Capretz