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An Analytical Method Of Determining Thickness Of Multi-Layer Films With Electron Microprobe, Yen-Cai Ho, Jia-Guang Chen, Xin-Lei Wang
An Analytical Method Of Determining Thickness Of Multi-Layer Films With Electron Microprobe, Yen-Cai Ho, Jia-Guang Chen, Xin-Lei Wang
Scanning Microscopy
In the previous work we have developed a series of theoretical corrections for calculating the emitted X-ray intensity in multi-layer films. By the use of these theories, along with careful experimental operation of the electron probe microanalysis (EPMA) and Monte Carlo iteration calculation, the thickness of each layer in multi-layer films can be determined.
To test the reliability of this method, the multi-layer film specimens Au/Cu/Si, Cu/Au/Si and Ag/Cr/Si of known thicknesses were analyzed at 20, 25, 30 and 35 keV. The percentage relative errors between the thicknesses determined using the correction procedures and those measured using nuclear backscattering are …
A Simulation Of Secondary Electron Trajectories In Solids, M. Kotera, T. Kishida, H. Suga
A Simulation Of Secondary Electron Trajectories In Solids, M. Kotera, T. Kishida, H. Suga
Scanning Microscopy
A Monte Carlo calculation model is introduced to simulate not only the primary electron behavior but also the secondary electron cascade in a specimen bombarded with an electron beam. Electrons having energy greater than 0.1keV are treated as "fast electrons" and the single scattering Monte Carlo model is adopted. Electrons having energy smaller than 0.1keV are treated as "slow electrons" and the electron cascade Monte Carlo model is used. The calculated results for the energy distribution of secondary electrons, and primary electron energy dependence of the total secondary yield and the backscattering yield are in good agreement with experimental results.
A Calculation Method Of X-Ray Emitted Intensity In Multi-Layer Films By Monte Carlo Simulation, Yen-Cai Ho, Jia-Guang Chen, Xin-Lei Wang
A Calculation Method Of X-Ray Emitted Intensity In Multi-Layer Films By Monte Carlo Simulation, Yen-Cai Ho, Jia-Guang Chen, Xin-Lei Wang
Scanning Microscopy
A calculation method of X-ray emitted intensity in multi-layer films is proposed in this paper. The method is based on the work developed by us: (1) a simplified physical model of electron scattering and Monte Carlo evaluations in a single medium and in multi-layer media and (2) the theories and the formulae for excitation, absorption and fluorescence of characteristic X-rays. The intensity ratio of X-rays for the known thickness films, Au/Cu/Si and Cr/Ni/Si, were calculated at 20, 25 and 30 keV. Calculated results are compared with experimental values of electron microprobe analysis for the multi-layer film specimens, and the correspondence …