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Full-Text Articles in Electrical and Computer Engineering
Modeling A Sensor To Improve Its Efficacy, Nabin K. Malakar, Daniil Gladkov, Kevin H. Knuth
Modeling A Sensor To Improve Its Efficacy, Nabin K. Malakar, Daniil Gladkov, Kevin H. Knuth
Physics Faculty Scholarship
Robots rely on sensors to provide them with information about their surroundings. However, high-quality sensors can be extremely expensive and cost-prohibitive. Thus many robotic systems must make due with lower-quality sensors. Here we demonstrate via a case study how modeling a sensor can improve its efficacy when employed within a Bayesian inferential framework. As a test bed we employ a robotic arm that is designed to autonomously take its own measurements using an inexpensive LEGO light sensor to estimate the position and radius of a white circle on a black field. The light sensor integrates the light arriving from a …
Surface Plasmonic Lens Driven Photoelectron Source For Multi-Beam Applications, Heon Joon Choi
Surface Plasmonic Lens Driven Photoelectron Source For Multi-Beam Applications, Heon Joon Choi
Legacy Theses & Dissertations (2009 - 2024)
Surface plasmon polariton (SPP) assisted photoelectron source array is proposed for use in distributed multiple electron beam lithography applications. Individual source is composed of a metal/dielectric surface structure with concentric circular grooves of subwavelength width surrounding a sub-wavelength aperture. Such optical power concentrators, called "plasmonic lenses", collect light incident over a broad area by converting it to surface electromagnetic waves, specifically SPP's, through diffraction by the sub-wavelength grooves surrounding the aperture. Through constructive interference of the generated SPPs between neighboring grooves, controlled by the periodicity of the grooves, high optical power densities can be achieved at the center of the …
Electron Beam Lithography Throughput And Resolution Enhancement With Innovative Blanker Design, Junru Ruan
Electron Beam Lithography Throughput And Resolution Enhancement With Innovative Blanker Design, Junru Ruan
Legacy Theses & Dissertations (2009 - 2024)
Electron Beam Lithography (EBL) is one of the most important and most widely used methods for nano-fabrication. The primary advantage of electron beam lithography is its high resolution, and its ability to expose nanometer features without a mask. On the other hand, one of the key limitations of electron beam lithography is throughput. Slow blanking speed is one of the major bottlenecks for the system speed. In this dissertation, I will first review the prior literature of high speed blanking. Thorough theoretical and experimental studies are done on the existing designs. Physical models are built and analytical ray tracing is …