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International Journal of Thin Film Science and Technology

Journal

2021

Resistivity

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Models Of Electric Transport In Bilayer Ni/Cu And In A Tri-Layer Ni/Pd/Cu Thin Films, M. K. Loudjani, C. Sella Sep 2021

Models Of Electric Transport In Bilayer Ni/Cu And In A Tri-Layer Ni/Pd/Cu Thin Films, M. K. Loudjani, C. Sella

International Journal of Thin Film Science and Technology

In this work we propose to measure the resistivities of bilayer Ni/Cu and tri-layer Ni/Pd/Cu thin films. We will compare the experimental resistivity of bilayer Ni/Cu or a tri-layerNi/Pd/Cu to the resistivity calculated from the resistivities of the simple layers of copper, nickel and palladium. We show that in the presence of aconstantelectric fieldparallel to the interface of Ni/Cu, electronic transport in bilayer, is equivalent to that of two distinct layers (of Ni and Cu) laid out in two parallel circuits, and that of a tri-layer Ni/Pd/Cu is equivalent to that the electronic transport of three distinct layers (of Ni, …


Choice Of A Substrate For Pdxni1-X Thin Films Used As Hydrogen Sensors, M. K. Loudjani Sep 2021

Choice Of A Substrate For Pdxni1-X Thin Films Used As Hydrogen Sensors, M. K. Loudjani

International Journal of Thin Film Science and Technology

In this work we studied the effect of the order at the interface of a Pd20Ni80 thin film deposited on different substrates on the electric resistance (R) thin film. We analyzed the fluctuations of the electric resistance (R) of Pd20Ni80 thin film after 1000 measurements. The relative error of the electric resistance (R/R) of a Pd20Ni80 thin film is minimal when the surface of the substrate is ordered, obtained with an -alumina single crystal substrate, while this ratio presents a strong drift in the absence of order at the interface when the substrate used is an amorphous silica glass. After …


Resistivity Of Bilayers Ni/Pd Films And Ni1-Xpdx Alloys Films, M. K. Loudjani, C. Sella Sep 2021

Resistivity Of Bilayers Ni/Pd Films And Ni1-Xpdx Alloys Films, M. K. Loudjani, C. Sella

International Journal of Thin Film Science and Technology

In this study, we present the resistivity measurements on pure metal films Ni, Pd, on binary alloys films Ni1-xPdx and on bilayers Ni/Pd films. We will analyze the effect of disorder related to the random distribution of elements in solid solution on the alloy Ni1-xPdx film resistivity. We used two types of substrates: glass-Corning and a polycrystalline a- alumina. The resistivity Ni1-xPdx alloy films at ambient temperature presents two maxima, one maximum near atomic composition Ni72Pd28 and the other near Ni30Pd70. The resistivities of Ni1-xPdx films deposited on the a-alumina substrates are 30% larger than the resistivities of the Ni1-xPdx …