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Full-Text Articles in Physics
In-Implanted Zno: Controlled Degenerate Surface Layer, David C. Look, Gary C. Farlow, F. Yaqoob, L. H. Vanamurthy, M. Huang
In-Implanted Zno: Controlled Degenerate Surface Layer, David C. Look, Gary C. Farlow, F. Yaqoob, L. H. Vanamurthy, M. Huang
Physics Faculty Publications
In was implanted into bulk ZnO creating a square profile with a thickness of about 100 nm and an In concentration of about 1×1020 cm-3. The layer was analyzed with Rutherford backscattering, temperature-dependent Hall effect, and low-temperature photoluminescence measurements. The implantation created a nearly degenerate carrier concentration n of about 2×1019 cm-3, but with a very low mobility μ, increasing from about 0.06 cm2/V s at 20 K to about 2 cm2/V s at 300 K. However, after annealing at 600 °C for 30 min, n increased to about 5×10 …
Ion Beam Mixing In Ag-Pd Alloys, J L. Klatt, R S. Averback, David Peak
Ion Beam Mixing In Ag-Pd Alloys, J L. Klatt, R S. Averback, David Peak
All Physics Faculty Publications
Ion beam mixing during 750 keV Kr+ irradiation at 80 K was measured on a series of Ag‐Pd alloys using Au marker atoms. The mixing in pure Ag was the greatest and it decreased monotonically with increasing Pd content, being a factor of 10 higher in pure Ag than in pure Pd. This large difference in mixing cannot be explained by the difference in cohesion energy between Ag and Pd in the thermodynamic model of ion beam mixing proposed by Johnson et al. [W. L. Johnson, Y. T. Cheng, M. Van Rossum, and M‐A. Nicolet, Nucl. …
Electrical Characterization Of Ion Implantation Into Gaas, David C. Look
Electrical Characterization Of Ion Implantation Into Gaas, David C. Look
Physics Faculty Publications
Recent advances in the characterization of ion‐implanted samples have included whole wafer mapping (topography) and depth profiling techniques. We review several methods for mapping electrical parameters, including the dark‐spot resistance (DSR), and the microwave photoconductance techniques. In addition, we suggest a new photo‐Hall technique which would allow mobility and carrier‐concentration mapping as well as that of resistivity . Finally, we review methods for obtaining ρ, μ, and depth profiles, with particular emphasis on the application of the magnetoresistance techniques in actual field‐effect transistor structures.
Ohmic Contacts To Al‐Implanted Znse, B. K. Shin, David C. Look, Y. S. Park
Ohmic Contacts To Al‐Implanted Znse, B. K. Shin, David C. Look, Y. S. Park
Physics Faculty Publications
No abstract provided.