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Electron And Hole Traps In N-Doped Zno Grown On P-Type Si Substrate By Mocvd, Zhaoqiang Fang, Bruce B. Claflin, David C. Look, Lei L. Kerr, Xiaonan Li

Physics Faculty Publications

Electron and hole traps in N-doped ZnO were investigated using a structure of n⁺-ZnO:Al/i-ZnO/ZnO:N grown on a p-Si substrate by metalorganic chemical vapor deposition (for growth of the ZnO:N layer) and sputtering deposition (for growth of the i-ZnO and n⁺-ZnO:Al layers). Current-voltage and capacitance-voltage characteristics measured at temperatures from 200 to 400 K show that the structure is an abrupt n⁺−p diode with very low leakage currents. By using deep level transient spectroscopy, two hole traps, H3 (0.35 eV) and H4 (0.48 eV), are found in the p-Si …