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University of Nebraska - Lincoln

Engineering Physics

Electron beam lithography

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A Low-Power Optical Electron Switch, Wayne Cheng-Wei Huang, Roger Bach, Peter Beierle, Herman Batelaan Feb 2014

A Low-Power Optical Electron Switch, Wayne Cheng-Wei Huang, Roger Bach, Peter Beierle, Herman Batelaan

Department of Physics and Astronomy: Faculty Publications

An electron beam is deflected when it passes over a silicon-nitride surface, if the surface is illuminated by a low-power continuous-wave diode laser. A deflection angle of up to 1.2 mrad is achieved for an electron beam of 29 μrad divergence. A mechanical beam-stop is used to demonstrate that the effect can act as an optical electron switch with a rise and fall time of 6 μs. Such a switch provides an alternative means to control electron beams, which may be useful in electron lithography and microscopy.