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Hole Drift Mobility Measurements On A-Si:H Using Surface And Uniformly Absorbed Illumination, Steluta A. Dinca, Eric A. Schiff, S. Guha, Baojie Yan, Jeff Yang

Physics - All Scholarship

The standard, time-of-flight method for measuring drift mobilities in semiconductors uses strongly absorbed illumination to create a sheet of photocarriers near an electrode interface. This method is problematic for solar cells deposited onto opaque substrates, and in particular cannot be used for hole photocarriers in hydrogenated amorphous silicon (a-Si:H) solar cells using stainless steel substrates. In this paper we report on the extension of the time-of-flight method that uses weakly absorbed illumination. We measured hole drift-mobilities on seven a-Si:H nip solar cells using strongly and weakly absorbed illumination incident through the n-layer. For thinner devices from two laboratories, the drift-mobilities …