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Scatterometry Of 50 Nm Half Pitch Features, Ruichao Zhu

Optical Science and Engineering ETDs

Metrology technologies are an essential adjunct to Integrated Circuit (I.C.) Semiconductor manufacturing. Scatterometry, an optical metrology, was chosen to measure 50 nm half pitch feature structures. A bread-board scatterometry system has been assembled to provide a non-contact, non-destructive, accurate and flexible measurement. A real-time, on-line scatterometry system has also been demonstrated and proven to provide a high throughput measurement.

Three different types of samples have been measured using the scatterometry setup. The wire-grid polarizer (WGP) sample has been made by Jet and Flash Nanoimprint Lithography with ~100 nm pitch and ~50 nm wide ~200 nm tall Al gratings on fused …