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Articles 1 - 5 of 5
Full-Text Articles in Nanoscience and Nanotechnology
Trihalomethane, Dihaloacetonitrile, And Total N-Nitrosamine Precursor Adsorption By Carbon Nanotubes: The Importance Of Surface Oxides And Pore Volume, Erin Needham
Graduate Theses and Dissertations
As drinking water sources become increasingly impaired, enhanced removal of natural organic matter (NOM) may be required to curb formation of disinfection byproducts (DBPs) upon chlor(am)ination. While carbon nanotubes (CNTs) can adsorb NOM, their properties for DBP precursor adsorption have not been elucidated. Nine types of CNTs were assessed for trihalomethane (THM), dihaloacetonitrile (DHAN), and total N-nitrosamine (TONO) precursor adsorption. Batch isotherm experiments were completed with lake water and, to simulate an impaired condition, effluent from a wastewater treatment plant (WWTP). Adsorption varied with CNT type and dose, with TONO precursors having the highest percent removals from WWTP effluent (up …
Total N-Nitrosamine Precursor Adsorption With Carbon Nanotubes: Elucidating Controlling Physiochemical Properties And Developing A Size-Resolved Precursor Surrogate, Erin Needham
Graduate Theses and Dissertations
As drinking water sources become increasingly impaired with nutrients and wastewater treatment plant (WWTP) effluent, formation of disinfection byproducts (DBPs) – such as trihalomethanes (THMs), dihaloacetonitriles (DHANs), and N-nitrosamines – during water treatment may also increase. N-nitrosamines may comprise the bulk of the chronic toxicity in treated drinking waters despite forming at low ng/L levels. This research seeks to elucidate physicochemical properties of carbon nanotubes (CNTs) for removal of DBP precursors, with an emphasis on total N-nitrosamines (TONO).
Batch experiments with CNTs were completed to assess adsorption of THM, DHAN, and TONO precursors; physiochemical properties of CNTs were quantified through …
Zirconium Diboride, Hexagonal Boron Nitride, And Amorphous Alumina Thin Films For High Temperature Applications, David Murdock Stewart
Zirconium Diboride, Hexagonal Boron Nitride, And Amorphous Alumina Thin Films For High Temperature Applications, David Murdock Stewart
Electronic Theses and Dissertations
The use of microelectronic sensors and actuators in harsh, high temperature environments, such as power plants, turbine engines, and industrial manufacturing, could greatly improve the safety, reliability, and energy efficiency of these processes. The primary challenge in implementing this technology is the breakdown and degradation of thin films used in fabricating these devices when exposed to high temperatures >800 °C and oxidizing atmospheres. Zirconium diboride, hexagonal boron nitride, and amorphous alumina are candidate materials for use as thin film sensor components due to their high melting temperatures and stable phases. Zirconium diboride thin films have metallic-like electrical conductivity and remain …
New Approach Of Modifying The Anatase To Rutile Transition Temperature In Tio2 Photocatalysts, Ciara Byrne, Rachel Fagan, Steven Hinder, Declan Mccormack, Suresh Pillai
New Approach Of Modifying The Anatase To Rutile Transition Temperature In Tio2 Photocatalysts, Ciara Byrne, Rachel Fagan, Steven Hinder, Declan Mccormack, Suresh Pillai
Articles
In pure synthetic titanium dioxide, the anatase to rutile phase transition usually occurs between the temperatures of 600 °C and 700 °C. The phase transition temperature can be altered by various methods, including modifying the precursor or by adding dopant or modifier to the TiO2 sample. In an attempt to investigate the phase transition using aromatic carboxylic acids, the current study examines the impact of increasing concentrations of benzoic acid (1 : 0, 1 : 1, 1 : 4 and 1 : 8 molar ratio TiO2 : benzoic acid) on anatase to rutile transition. The samples were characterised using Raman …
Influence Of Reaction With Xef2 On Surface Adhesion Of Al And Al2o3 Surfaces, Tianfu Zhang, Jeong Park, Wenyu Huang, Gabor A. Somoraji
Influence Of Reaction With Xef2 On Surface Adhesion Of Al And Al2o3 Surfaces, Tianfu Zhang, Jeong Park, Wenyu Huang, Gabor A. Somoraji
Wenyu Huang
The change in surfaceadhesion after fluorination of Al and Al2O3surfaces using XeF2 was investigated with atomic force microscopy. The chemical interaction between XeF2 and Al and Al2O3surfaces was studied by in situx-ray photoelectron spectroscopy. Fresh Al and Al2O3surfaces were obtained by etching top silicon layers of Si∕Al and Si∕Al2O3 with XeF2. The surfaceadhesion and chemical composition were measured after the exposure to air or annealing (at 200°C under vacuum). The correlation between the adhesion force increase and presence of AlF3 on the surface was revealed.