Nanoscience and Nanotechnology Commons^™

In Vacuo Fabrication And Electronic Structure Characterization Of Atomic Layer Deposition Thin Films, Michael Schaefer

USF Tampa Graduate Theses and Dissertations

Improvement of novel electronic devices is possible by tailor-designing the electronic structure at device interfaces. Common problems observed at interfaces are related to unwanted band alignment caused by the chemical diversity of interface partners, influencing device performance negatively. One way to address this problem is by introducing ultra-thin interfacial dipole layers, steering the band alignment in a desired direction. The requirements are strict in terms of thickness, conformity and low density of defects, making sophisticated deposition techniques necessary. Atomic layer deposition (ALD) with its Ångstrom-precise thickness control can fulfill those requirements.

The work presented here encompasses the implementation of an …