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Nanoscale Science & Engineering (discontinued with class year 2014)

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Organometallic Carboxylate Resists For Euv With High Sensitivity, James Passarelli May 2015

Organometallic Carboxylate Resists For Euv With High Sensitivity, James Passarelli

Nanoscale Science & Engineering (discontinued with class year 2014)

We have developed organometallic carboxylate compounds [RnM(O2CR’)2] capable of acting as negative-tone EUV resists. Overall, the best and fastest resists contain antimony, are pentavalent and the carboxylate group contains a polymerizable olefin (e.g. acrylate, methacrylate or styrenecarboxylate). Evidence suggests that high sensitivity is achieved through the polymerization of olefins in the exposed region. We have performed a systematic sensitivity study of molecules of the type RnM(O2CR’)2 where we have studied seven R groups, four main group metals (M), and three polymerizable carboxylate groups (O2CR’). We found that the greatest predictor of sensitivity of the RnSb ...