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Full-Text Articles in Nanoscience and Nanotechnology
Augmenting Mask-Based Lithography With Direct Laser Writing To Increase Resolution And Speed, Miles Patrick Lim
Senior Projects Fall 2017
We present combined direct-laser-writing and UV Lithography in SU-8F and S1813 as a fast and flexible lithographic technique for the prototyping of functional polymer devices and pattern transfer applications. Direct laser writing (DLW), which is performed by focusing a laser through a microscope objective, is a useful alternative method for patterning photoresists with sub-micron resolution. DLW however, can be time consuming if the pattern density is high since it is a serial technique. Typically, dense patterns are made using conventional mask-based UV lithography, but these masks can be quite expensive if the resolution is high and the mask cannot be ...