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Full-Text Articles in Nanoscience and Nanotechnology

Fabrication, Characterization And Simulation Of Non-Lithographic Nanostructures And Their Potential Applications, Neelanjan Bhattacharya Aug 2010

Fabrication, Characterization And Simulation Of Non-Lithographic Nanostructures And Their Potential Applications, Neelanjan Bhattacharya

UNLV Theses, Dissertations, Professional Papers, and Capstones

The dissertation describes the formation of porous silicon through the pores of porous alumina on a silicon substrate. Porous silicon, by itself, is inherently a non-uniform material that has non-uniform optical and electronic properties. In addition, it is also mechanically fragile material requiring careful material handling. The porous silicon fabricated through the nanosized pores of porous alumina are expected to mitigate these problems, thereby enhancing commercial viability of the device. The porous silicon as well the porous alumina have been synthesized through anodisation for various parameters and also various types of anodizing electrolytes. The porous silicon, so obtained have been …


An Ultrahigh Vacuum Complementary Metal Oxide Silicon Compatible Nonlithographic System To Fabricate Nanoparticle-Based Devices, Arghya Banerjee, Biswajit Das Mar 2008

An Ultrahigh Vacuum Complementary Metal Oxide Silicon Compatible Nonlithographic System To Fabricate Nanoparticle-Based Devices, Arghya Banerjee, Biswajit Das

Electrical & Computer Engineering Faculty Research

Nanoparticles of metals and semiconductors are promising for the implementation of a variety of photonic and electronic devices with superior performances and new functionalities. However, their successful implementation has been limited due to the lack of appropriate fabrication processes that are suitable for volume manufacturing. The current techniques for the fabrication of nanoparticles either are solution based, thus requiring complex surface passivation, or have severe constraints over the choice of particle size and material. We have developed an ultrahigh vacuum system for the implementation of a complex nanosystem that is flexible and compatible with the silicon integrated circuit process, thus …