Mechanical Engineering Commons^™

Electrophoretic Deposition Of Gallium With High Deposition Rate, Hanfei Zhang, Yiping Mao, Sunand Santhanagopalan, Dennis Desheng Meng

Michigan Tech Publications

In this work, electrophoretic deposition (EPD) is reported to form gallium thin film with high deposition rate and low cost while avoiding the highly toxic chemicals typically used in electroplating. A maximum deposition rate of ~0.6 μm/min, almost one order of magnitude higher than the typical value reported for electroplating, is obtained when employing a set of proper deposition parameters. The thickness of the film is shown to increase with deposition time when sequential deposition is employed. The concentration of Mg(NO₃)₂, the charging salt, is also found to be a critical factor to control the deposition …