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In-Situ Tem Plasma Chip Nanofabrication And Characterization, Xuebo Cui Jan 2014

In-Situ Tem Plasma Chip Nanofabrication And Characterization, Xuebo Cui

Dissertations, Master's Theses and Master's Reports - Open

A silicon-based microcell was fabricated with the potential for use in in-situ transmission electron microscopy (TEM) of materials under plasma processing. The microcell consisted of 50 nm-thick film of silicon nitride observation window with 60μm distance between two electrodes. E-beam scattering Mont Carlo simulation showed that the silicon nitride thin film would have very low scattering effect on TEM primary electron beam accelerated at 200 keV. Only 4.7% of primary electrons were scattered by silicon nitride thin film and the Ar gas (60 μm thick at 1 atm pressure) filling the space between silicon nitride films. Theoretical calculation also ...