Open Access. Powered by Scholars. Published by Universities.®

Engineering Commons

Open Access. Powered by Scholars. Published by Universities.®

2019

Journal of the Microelectronic Engineering Conference

Oxide mandrel

Articles 1 - 1 of 1

Full-Text Articles in Engineering

Fabrication Of Sub-300 Nm Fins At Rit By Sadp, Kelly Weiskittel Apr 2019

Fabrication Of Sub-300 Nm Fins At Rit By Sadp, Kelly Weiskittel

Journal of the Microelectronic Engineering Conference

The goal of fabricating sub-300 nm fins with the implementation of self-aligned double patterning (SADP) at Rochester Institute of Technology’s (RIT’s) Semiconductor & Microsystems Fabrication Laboratory (SMFL) was not realized completely. An energy dose meander was completed in order to qualify a new resist being used with the fabrication process that Christopher O’Connell developed for his graduate thesis. Manual spin coating of Spin-on-Carbon (SOC), bottom antireflective coating (BARC), and photoresist were all qualified. A 2:1 ratio of AZ MiR 701 photoresist to PGMEA was used to thin the resist for implementation of a 300 nm coat. Low ...