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Fabrication Of Photonic Lpcvd Silicon-Nitride Waveguides, Robert Dalheim
Fabrication Of Photonic Lpcvd Silicon-Nitride Waveguides, Robert Dalheim
Journal of the Microelectronic Engineering Conference
The purpose of this project was to develop a repeatable process flow for Silicon-Nitride optical waveguides at RIT. Previous projects have fabricated optical waveguides out of amorphous silicon and polymers but never out of Nitride. The grating coupler pitch was varied from 700nm to 1500nm and the length was varied from 100μm to 1000μm. A target Nitride deposition thicknesses of 250nm, 500nm, and 750nm were deposited through LPCVD methods and were measured to be 150nm, 450nm, and 770nm. The thicknesses were chosen to be half the waveguide width for optimal transmission. Fabrication was successful for all three waveguide widths on …