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Low Damage Processing And Process Characterization, Xianmin Tang

Dissertations, Theses, and Masters Projects

Two novel plasma sources (one neutral source and one pulsed inductively coupled plasma source) and ashing process characterization were investigated. The primary goal was to characterize these source properties and develop corresponding applications. The study includes process damage assessment with these two sources and another continuous wave (13.56MHz) plasma source. A global average simulation of the pulsed discharges was also included.;The transient plasma density and electron temperature from the double probe analysis were compared with single Langmuir probe results with sheath displacement corrections in pulsed discharges (200Hz--10kHz). The equivalent resistance method can be used effectively to analyze these double probe …