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Articles 1 - 4 of 4
Full-Text Articles in Arts and Humanities
Ken Jacobs, Alchemist, Ara C. Osterweil
Ken Jacobs, Alchemist, Ara C. Osterweil
Criticism
Optic Antics: The Cinema of Ken Jacobs edited by Michele Pierson, David E. James, and Paul Arthur. Oxford: Oxford University Press, 2011. Pp. 312; 48 photographs. $99.00 cloth, $39.95 paper, 26.99 E-book.
Glittering Logic In A Minor Key, Jon Davies
Glittering Logic In A Minor Key, Jon Davies
Criticism
Glorious Catastrophe: Jack Smith, Performance and Visual Culture by Dominic Johnson. Rethinking Art’s Histories. Manchester, England: Manchester University Press, 2012. Pp. 256; 40 black-and-white illustrations. $95.00 cloth, $32.95 paper.
In Particularity We Trust:Richard Dutcher's Mormon Quartet And A Latter-Day Saint Spiritual Film Style, Mark Sheffield Brown
In Particularity We Trust:Richard Dutcher's Mormon Quartet And A Latter-Day Saint Spiritual Film Style, Mark Sheffield Brown
Wayne State University Dissertations
Between 2000 and 2008, writer/director Richard Dutcher made four films with narratives focused primarily on members of the Church of Jesus Christ of Latter-Day Saints. The films are explicitly Mormon-related in their content, but I argue they are also inherently Mormon in their style. Critic and filmmaker Paul Schrader argues there is a particular style of filmmaking, a dialect of the cinematic language if you will, that enables viewers to experience an encounter with a Transcendent Divinity. The contention of this dissertation is that Schrader's views were simultaneously too general and too narrow. I draw on Clive Marsh's call for …
Precursors And Processes For The Growth Of Metallic First Row Transition Metal Films By Atomic Layer Deposition, Lakmal Charidu Kalutarage
Precursors And Processes For The Growth Of Metallic First Row Transition Metal Films By Atomic Layer Deposition, Lakmal Charidu Kalutarage
Wayne State University Dissertations
As a result of the continuous miniaturization of microelectronics devices, atomic layer deposition (ALD) has gained much attention in the recent years. ALD allows the deposition of ultra-thin conformal films with accurate thickness control due to the self-limiting growth mechanism. The microelectronics industry requires the growth of metallic first row transition metal films by ALD. Due to the positive electrochemical potentials, the ALD growth of noble metal thin films has been well developed in the past. By contrast, the ALD growth of first row transition metal films remains poorly documented. The reasons for this scarcity include the lack of suitable …