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Determining Spectral Sensitivity Of Kodak Micro Positive Resist 820, Matthew L. Huck
Determining Spectral Sensitivity Of Kodak Micro Positive Resist 820, Matthew L. Huck
Theses
The spectral sensitivity of KODAK Micro Positive Resist 820 has been determined for the spectral range of 300nm to 500nm. A xenon-source monochrometer was used in a hard contact exposing system. Se/isitivity is defined as the inverse of the exposure (mj/cm ) needed to produce an image in a photoresist coated plate having walls of 70 normal slope. Low intensity reciprocity law failure has been conclusively shown to exist in this resist with exposure intensities of 100 mw/cm and below. Guide lines have been drawn up, based on the procedures and results of the experimentation, to assist photoresist users in …
The Effects Of Agitation In Positive Photoresist Image Quality When Using A Bubble Development System, Keith D. Mogerley
The Effects Of Agitation In Positive Photoresist Image Quality When Using A Bubble Development System, Keith D. Mogerley
Theses
An important goal of the microelectronics industry is to make new technological advances while keeping the cost of the fabrication process down. To achieve this goal, the microelectronics industry are presently placing more active devices on each chip, while at the same time trying to increase the number of successful chips per wafer. In order for the industry to successfully do this, they must reduce all of the dimensions in the circuit while trying to maintain its physical, chemical, and functional properties. These demands have made all steps of the fabrication process more critical. The scope of this project will …