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Dislocation Reduction In Gan Grown On Porous Tin Networks By Metal-Organic Vapor-Phase Epitaxy, Y. Fu, F. Yun, Y. T. Moon, Ü. Özgür, J. Q. Xie, X. F. Ni, N. Biyikli, H. Morkoç, Lin Zhou, David J. Smith, C. K. Inoki, T. S. Kuan
Dislocation Reduction In Gan Grown On Porous Tin Networks By Metal-Organic Vapor-Phase Epitaxy, Y. Fu, F. Yun, Y. T. Moon, Ü. Özgür, J. Q. Xie, X. F. Ni, N. Biyikli, H. Morkoç, Lin Zhou, David J. Smith, C. K. Inoki, T. S. Kuan
Electrical and Computer Engineering Publications
We report on the effectiveness of porous TiN nanonetworks on the reduction of threading dislocations (TDs) in GaN grown by metal-organic vapor-phase epitaxy (MOVPE). The porous TiN networks were formed by in situ annealing of thin-deposited Ti films deposited ex situ on GaN templates within the MOVPE growth chamber. Different annealing parameters in relation to surface porosity of TiN networks were investigated. Transmission electron micrographs indicated dislocation reduction by factors of up to 10 in GaN layers grown on the TiN nanonetwork, compared with a control sample. TiN prevented many dislocations present in the GaN templates from penetrating into the …