Open Access. Powered by Scholars. Published by Universities.®
- Publication
- Publication Type
Articles 1 - 3 of 3
Full-Text Articles in Entire DC Network
Resist Process Window Characterization For The 45-Nm Node Using An Interferometric Immersion Microstepper, Anatoly Bourov, Stewart Robertson, Bruce W. Smith, Michael Slocum, Emil C. Piscani
Resist Process Window Characterization For The 45-Nm Node Using An Interferometric Immersion Microstepper, Anatoly Bourov, Stewart Robertson, Bruce W. Smith, Michael Slocum, Emil C. Piscani
Presentations and other scholarship
Projection and interference imaging modalities for application to IC microlithography were compared at the 90 nm imaging node. The basis for comparison included simulated two-dimensional image in resist, simulated resist linesize, as well as experimental resist linesize response through a wide range of dose and focus values. Using resist CD as the main response (both in simulation and experimental comparisons), the two imaging modes were found nearly equivalent, as long as a suitable Focus-Modulation conversion is used. A Focus-Modulation lookup table was generated for the 45 nm imaging node, and experimental resist response was measured using an interferometric tool. A …
Experimental Measurement Of Photoresist Modulation Curves, Anatoly Bourov, Stewart Robertson, Bruce W. Smith, Michael Slocum, Emil C. Piscani
Experimental Measurement Of Photoresist Modulation Curves, Anatoly Bourov, Stewart Robertson, Bruce W. Smith, Michael Slocum, Emil C. Piscani
Presentations and other scholarship
An approach to measurement of resist CD response to image modulation and dose is presented. An empirical model with just three terms is used to describe this response, allowing for direct calculation of photoresist modulation curves. A thresholded latent image response model has been tested to describe CD response for both 90 nm and 45 nm geometry. An assumption of a linear optical image to photoresist latent image correlation is shown as adequate for the 90 nm case, while the 45 nm case demonstrates significant non-linear behavior. This failure indicates the inadequacy of a “resist blur” as a complete descriptive …
Printing Studies With Conductive Inks And Exploration Of New Conducting Polymer Compositions, Anupama Karwa
Printing Studies With Conductive Inks And Exploration Of New Conducting Polymer Compositions, Anupama Karwa
Theses
In addition to low cost and high volume, continuous production of devices such as transistors and RFID tags, printable electronics show promise in the fabrication of a multiplicity of sensors, displays, photovoltaic arrays, smart cards, etc. Due to flexibility and insensitivity to substrates, the use of organics in printed electronics has opened up a number of new opportunities in novel applications. In the present work, the process capability of flexography and offset lithography for patterning conductive materials was determined using small scale equipment (rotary letterpress and duplicator respectively). Process parameters including: type of substrate, line widths, line gaps, print thickness, …