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The Dissipated Power In Atomic Force Microscopy Due To Interactions With A Capillary Fluid Layer, Nicole N. Hashemi, M.R. Paul, H. Dankowicz, W. Jhe
The Dissipated Power In Atomic Force Microscopy Due To Interactions With A Capillary Fluid Layer, Nicole N. Hashemi, M.R. Paul, H. Dankowicz, W. Jhe
Nastaran Hashemi
We study the power dissipated by the tip of an oscillating micron-scale cantilever as it interacts with a sample using a nonlinear model of the tip-surface force interactions that includes attractive, adhesive, repulsive, and capillary contributions. The force interactions of the model are entirely conservative and the dissipated power is due to the hysteretic nature of the interaction with the capillary fluid layer. Using numerical techniques tailored for nonlinear and discontinuous dynamical systems we compute the exact dissipated power over a range of experimentally relevant conditions. This is accomplished by computing precisely the fraction of oscillations that break the fluid …
Influence Of Reaction With Xef2 On Surface Adhesion Of Al And Al2o3 Surfaces, Tianfu Zhang, Jeong Park, Wenyu Huang, Gabor A. Somoraji
Influence Of Reaction With Xef2 On Surface Adhesion Of Al And Al2o3 Surfaces, Tianfu Zhang, Jeong Park, Wenyu Huang, Gabor A. Somoraji
Wenyu Huang
The change in surfaceadhesion after fluorination of Al and Al2O3surfaces using XeF2 was investigated with atomic force microscopy. The chemical interaction between XeF2 and Al and Al2O3surfaces was studied by in situx-ray photoelectron spectroscopy. Fresh Al and Al2O3surfaces were obtained by etching top silicon layers of Si∕Al and Si∕Al2O3 with XeF2. The surfaceadhesion and chemical composition were measured after the exposure to air or annealing (at 200°C under vacuum). The correlation between the adhesion force increase and presence of AlF3 on the surface was revealed.