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Ultra-Violet Lithography Of Thick Photoresist For The Applications In Biomems And Micro Optics, Ren Yang
Ultra-Violet Lithography Of Thick Photoresist For The Applications In Biomems And Micro Optics, Ren Yang
LSU Doctoral Dissertations
UV lithography of thick photoresist is widely used in microelectromechanical systems (MEMS) and micro-optoelectromechanical systems (MOEMS). SU-8 is a typical negative tone thick photoresist for micro systems, and can be used for both structural material and pattern transfer. This dissertation presents an effort to comprehensively study these important subjects. The first part, and the most fundamental part of this dissertation concentrated on the numerical analysis and experimental study of the wavelength dependent absorbance of SU-8 and the diffraction effects on the sidewall profiles of the microstructures made using UV lithography of SU-8. This study has laid the foundation for all …
Design And Fabrication Of Electromagnetic Micro-Relays Using The Uv-Liga Technique, John Dalton Williams
Design And Fabrication Of Electromagnetic Micro-Relays Using The Uv-Liga Technique, John Dalton Williams
LSU Doctoral Dissertations
This dissertation reports a research effort to microfabricate an electromagnetic relay for power applications using a multilayer UV-LIGA process. A mechanically wrapped coil was used and very simple design for the magnetic circuit was adopted to increase the design flexibility and performances. The broad material selection and the capability of making high aspect ratio microstructures of the UV-LIGA make the technology best suited for fabricating microelectromechanical power relays. Fabrication of the device required significant advances in the optical lithography of SU-8 negative photoresist. Research proved that aspect-ratios up to 40:1 in isolated open field structures of thickness between 1 and …