Open Access. Powered by Scholars. Published by Universities.®

Digital Commons Network

Open Access. Powered by Scholars. Published by Universities.®

PDF

MEMS

LSU Doctoral Dissertations

Electrical and Computer Engineering

Publication Year

Articles 1 - 2 of 2

Full-Text Articles in Entire DC Network

Monolithic Integration Of High-Aspect-Ratio Microstructures With Cmos Circuitry, Tinghui Xin Jan 2007

Monolithic Integration Of High-Aspect-Ratio Microstructures With Cmos Circuitry, Tinghui Xin

LSU Doctoral Dissertations

This work involves developing processing techniques for monolithically integrating a high-aspect-ratio microstructures with CMOS circuitry. A microsystem comprising of a microprobe array and signal processing circuitry is utilized as a test vehicle to demonstrate this fabrication process. One potential application of this microsystem is for recording neural signals from the central nervous system. The main results include thick photoresist processing, DC and pulse electroplating to form high-aspect-ratio microprobes, microprobe sharpening and developing a post-IC monolithic integration process. SU-8 is utilized for thick photoresist application. This work focuses on realization of a deep microrecess array in thick resists rather than traditional …


Laterally Movable Gate Field Effect Transistor (Lmgfet) For Microsensor And Microactuator Applications, In-Hyouk Song Jan 2005

Laterally Movable Gate Field Effect Transistor (Lmgfet) For Microsensor And Microactuator Applications, In-Hyouk Song

LSU Doctoral Dissertations

Laterally Movable Gate Field Effect Transistor (LMGFET) invented at LSU as a microactuator is the subject of study in this research. The gate moving in lateral direction in a LMGFET changes channel width but keeps the channel length and the gap between the metal gate and the gate oxide constant. LMGFET offers linear change in drain current with gate motion and a large displacement range. This research is the first demonstration of LMGFET. In this dissertation, a post-IC LIGA-like process for LMGFET microstructure fabrication has been developed that is compatible with monolithic integration with CMOS circuitry. A two-mask post-IC process …