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Fabrication Of Nanopillars By Nanosphere Lithography, Chin Li Cheung, R. J. Nikolic, C. E. Reinhardt, T. F. Wang
Fabrication Of Nanopillars By Nanosphere Lithography, Chin Li Cheung, R. J. Nikolic, C. E. Reinhardt, T. F. Wang
Barry Chin Li Cheung Publications
A low cost nanosphere lithography method for patterning and generation of semiconductor nanostructures provides a potential alternative to the conventional top-down fabrication techniques. Forests of silicon pillars of sub-500 nm diameter and with an aspect ratio up to 10 were fabricated using a combination of the nanosphere lithography and deep reactive ion etching techniques. The nanosphere etch mask coated silicon substrates were etched using oxygen plasma and a timemultiplexed “Bosch” process to produce nanopillars of different length, diameter and separation. Scanning electron microscopy data indicate that the silicon etch rates with the nanoscale etch masks decrease linearly with increasing aspect …
Future Of Semiconductor Based Thermal Neutron Detectors, R. J. Nikolić, Chin Li Cheung, C. E. Reinhardt, T. F. Wang
Future Of Semiconductor Based Thermal Neutron Detectors, R. J. Nikolić, Chin Li Cheung, C. E. Reinhardt, T. F. Wang
Barry Chin Li Cheung Publications
Thermal neutron detectors have seen only incremental improvements over the last decades. In this paper we overview the current technology of choice for thermal neutron detection – 3He tubes, which suffer from, moderate to poor fieldability, and low absolute efficiency. The need for improved neutron detection is evident due to this technology gap and the fact that neutrons are a highly specific indicator of fissile material. Recognizing this need, we propose to exploit recent advances in microfabrication technology for building the next generation of semiconductor thermal neutron detectors for national security requirements, for applications requiring excellent fieldability of small …