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University of Massachusetts Amherst

Masters Theses 1911 - February 2014

1982

Electron beam

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New Polymeric Resists For Electron Beam Lithography., Ameeta Narula Jan 1982

New Polymeric Resists For Electron Beam Lithography., Ameeta Narula

Masters Theses 1911 - February 2014

Multiple thin films which are conducting, insulating and semiconducting are important components of integrated circuit technology. Circuits are fabricated from these layers by patterning the films to form isolated circuit elements which are themselves interconnected by patterned films (1).