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University of Central Florida

UCF Patents

1996

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Process For Determination Of Text Relevancy, James Driscoll Nov 1996

Process For Determination Of Text Relevancy, James Driscoll

UCF Patents

This is a procedure for determining text relevancy and can be used to enhance the retrieval of text documents by search queries. This system helps a user intelligently and rapidly locate information found in large textual databases. A first embodiment determines the common meanings between each word in the query and each word in the document. Then an adjustment is made for words in the query that are not in the documents. Further, weights are calculated for both the semantic components in the query and the semantic components in the documents. These weights are multiplied together, and their products are …


Water Laser Plasma X-Ray Point Source, Martin Richardson, Kai Gabel, Feng Jin, Masataka Kado Nov 1996

Water Laser Plasma X-Ray Point Source, Martin Richardson, Kai Gabel, Feng Jin, Masataka Kado

UCF Patents

A high repetition-rate laser plasma target source system wherein ice crystals are irradiated by a laser and lithography system. The target source system comprises in a preferred embodiment a liquid tank source and freezer means which freezes microscopic particles into crystal shapes which are projected by a nozzle jet from a high repetition rate liquid-droplet injector into the path of a flashing laser beam, which results in producing soft x-rays of approximately 11.7 nm and 13 nm. Uncollected and unshot target crystals are collected and reliquified by a heater source in order to be recycled back to the liquid tank …


Air Distribution Fan Recycling Control, Armin Rudd Aug 1996

Air Distribution Fan Recycling Control, Armin Rudd

UCF Patents

An system for controlling the operation of the circulating fan of a closed central air conditioning(CAC) system is disclosed. The system periodically activates and deactivates only the circulating fan after a preselected delay time from the normal running of the cooling and heating modes of the CAC system. The preselected delay time is adjustable based on non thermostat parameters and include parameters such as room volume size to be ventilated and the number of occupants in the room. The control can periodically distribute and mix ventilation air or spot-conditioned (humidified, de-humidified, or cleaned) air while the CAC system is not …


High Speed Pulse Slicer/Demultiplexer With Gain For Use In Solid State Regenerative Amplifier Systems, Peter Delfyett, Sangyoun Gee, A. Yusim Aug 1996

High Speed Pulse Slicer/Demultiplexer With Gain For Use In Solid State Regenerative Amplifier Systems, Peter Delfyett, Sangyoun Gee, A. Yusim

UCF Patents

A mode-locked solid state laser is disclosed for generating ultrashort optical pulses from a semiconductor type laser. A semiconductor pulse slicer/demultiplexer/modulator with gain amplification is used to modulate and amplify a generated optical beam whether or not the beam is pulsed, continuous wave, q-switched, or modelocked. Alternatively, the semiconductor pulse slicer/demultiplexer/modulator with gain amplification is used to gate a generated optical beam whether or not the beam is pulsed, continuous wave, q-switched, or modelocked. Alternatively, the semiconductor pulse slicer/demultiplexer/modulator with gain amplification is used to demultiplex a generated optical beam whether or not the beam is pulsed, continuous wave, q-switched, …


3d Realtime Fluid Animation By Navier-Stokes Equations, Niels Da Vitoria Lobo, Chen Jinxiong Jul 1996

3d Realtime Fluid Animation By Navier-Stokes Equations, Niels Da Vitoria Lobo, Chen Jinxiong

UCF Patents

This is a method for physically-based modeling of three dimensional (3D) general fluid animation in computer graphics. By solving the two dimensional (2D) Navier-Stokes equations using a Computational Fluid Dynamics method, we map it into 3D using the corresponding pressures in the fluid flow field. The method achieves realistic real-time fluid animation by solving the physical governing laws of fluids but avoiding the extensive 3D fluid dynamics computation. Unlike previous computer graphics fluid models, our approach can model many different fluid behaviors by changing the internal or external boundary conditions. It can also model different kinds of fluids by varying …


Photocatalytic Surfacing Agents For Inhibition Of Algae Growth., Clovis Linkous May 1996

Photocatalytic Surfacing Agents For Inhibition Of Algae Growth., Clovis Linkous

UCF Patents

Mixtures that use photoactive agents that inhibit the growth of algae are disclosed. The agents include concentrations of approximately at least 5% to approximately 50% TiO.sub.2, WO.sub.3, PtWO.sub.3 --Pt--WO.sub.3, or Pt--TiO.sub.2. The agents can be combined together, and/or each agent can be combined with various coatings such as but not limited to a cement or a polymer binder. The coatings and agents can be applyed to surfaces that are exposed to water such as but not limited to an aquarium, liners on the inner walls of swimming pools, drinking water tanks and the like. Further, applications can include using the …


Cvd Method Of Producing And Doping Fullerenes, Lee Chow Apr 1996

Cvd Method Of Producing And Doping Fullerenes, Lee Chow

UCF Patents

Methods of producing fullerenes in large-macroscopic quantities inexpensively is disclosed without using solid carbon material such as graphite. In a preferred embodiment, fullerenes are formed by a hot filament CVD procedure. The fullerenes occur in the soot that forms as a by-product on the edges of the substrate holder. Mass spectrum of soot deposits shows lines corresponding to C60. From the typical concentrations of gaseous species in the diamond-growing CVD chamber, hydrocarbon species including CH3 or C2H2 can be the precursors for the formation of fullerenes in the CVD chamber. A method of using fullerenes to enhance the properties of …


Efficient Narrow Spectral Width Soft X-Ray Discharge Sources, William Silfvast Mar 1996

Efficient Narrow Spectral Width Soft X-Ray Discharge Sources, William Silfvast

UCF Patents

Methods for making pulsed and continuous discharge plasma light sources for extreme ultraviolet(EUV) projection lithography and soft-x-ray microscopy as well as other applications are disclosed. A first light source of doubly ionized lithium ions emits over a narrow bandwidth of approximately 13.5 nm. A second light source of beryllium ions radiates at approximately 7.60 nm. A third light source of boron ions radiates at approximately 4.86 nm, and a fourth light source of carbon ions radiates at approximately 3.38 nm. Preferred embodiments of apparatus for generating pulsed and continuous discharge sources are disclosed.