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Retaining Ring Material Wear Analysis And Testing, Thomas Headland, Barten Hansen, Austin Fisher, Kevin Hurtado

Mechanical Engineering

The chemical mechanical planarization (CMP) of wafers for integrated circuits is an essential – yet expensive – step in their manufacture. CMP machine down-time due to the replacement of process consumables, such as wafer retaining rings, is a significant contributor to the process cost. To reduce the operational cost of their CMP machines, Revasum is interested in exploring new designs and materials for wafer retaining rings to increase their operational lifetime. Background research showed that there is currently no suitable method for testing new retaining ring designs and materials for wear characteristics specific to the CMP process. Available wear testing …

Final Design Review: Wear Test Machine, Justin Ju-Han Hou, Abraham Jack Mitchell, Alexandra Denae Pavano, Jahyun Kaylla Son

Mechanical Engineering

A California Polytechnic State University Senior Project team has been tasked by Marvin Engineering Co. to design and build a friction wear test fixture; the fixture is to characterize the coefficient of friction and potential friction wear of various industry adopted metal pairings in an oxygen-free environment. This final design review serves to document project research, full design process, method of operation of final product, and a comprehensive testing procedure.

The R&D department at Marvin Engineering Co. proposed this investigation in order to explore the phenomenon of friction and adhesive wear, specifically the occurrence of galling between stainless steel surfaces. …