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Silicon Oxide Micromodule Capacitors, W. B. Nowak, J. J. O'Connor Dec 2010

Silicon Oxide Micromodule Capacitors, W. B. Nowak, J. J. O'Connor

Welville B. Nowak

Silicon oxide capacitors have been developed on micromodule wafers (0.310-in. sq. with three termination notches per side). Each microelement contains 1, 2, 3, or 4 capacitors with values of 1120 and 560, 180, 100 and 68 pf per capacitor, respectively. The 1120 pf capacitor is double layered. In addition to the general requirements of microelements and micromodules, some of the more important specifications these capacitors must meet are: dissipation factor (DF) not exceeding 0.015, insulation resistance (IR) at 50 volts exceeding 10,000 megohms (25°C) and 750 megohms (125°c), 50 WVDC and 150 volts dielectric withstanding voltage (DWV), Δ C not …


Structural And Magnetic Characterization Of Amorphous Gd₂Fe₁₄B Thin Films, S. E. Bushnell, P. C. Dorsey, W. B. Nowak, C. Vittoria Dec 2010

Structural And Magnetic Characterization Of Amorphous Gd₂Fe₁₄B Thin Films, S. E. Bushnell, P. C. Dorsey, W. B. Nowak, C. Vittoria

Welville B. Nowak

Thin amorphous films of nominal composition Gd₂Fe₁₄B were fabricated on Si (100) substrates using ion‐beam sputtering for the purpose of establishing their structural and magnetic properties at room temperature. X‐ray‐diffraction scans performed on as‐deposited and annealed films revealed an amorphous structure. The as‐deposited saturation magnetization was found to be 8101 G at room temperature suggesting ferrimagnetic ordering with anti‐parallel coupling similar to other heavy rare earth‐transition metal systems. Results from in‐plane and perpendicular ferromagnetic resonance experiments conducted at 9.108 GHz showed the films to be inhomogeneous. This was evident from the presence of two in‐plane resonance lines and spin‐wave spectra …


The Measurement Of Magnetostriction Constants Of Thin Films Using Planar Microwave Devices And Ferromagnetic Resonance, S. E. Bushnell, W. B. Nowak, S. A. Oliver, C. Vittoria Dec 2010

The Measurement Of Magnetostriction Constants Of Thin Films Using Planar Microwave Devices And Ferromagnetic Resonance, S. E. Bushnell, W. B. Nowak, S. A. Oliver, C. Vittoria

Welville B. Nowak

In this paper we introduce a new technique for measuring the saturation magnetostriction constant (λs) for isotropic polycrystalline thin films. The technique makes use of nonresonant planar microwave structures together with a novel stressing mechanism to induce a shift in the resonant field of a magnetic thin film as measured by a ferromagnetic resonance (FMR) experiment. Measurement of the shift induced by a uniaxial stress allows for determination of λs via a magnetic resonance analysis. Either a slotline device or coplanar waveguide (CPW) was used as the source of the microwave excitation field depending upon the orientation of the dc …


Magnetic And Structural Investigation Of Heat Treated Ion Beam Sputtered Amorphous Co₇₄Fe₆B₁₅Si₅ Films, V. G. Harris, S. A. Oliver, W. B. Nowak, C. Vittoria, R. J. Culbertson, W. T. Elam, K. H. Kim Dec 2010

Magnetic And Structural Investigation Of Heat Treated Ion Beam Sputtered Amorphous Co₇₄Fe₆B₁₅Si₅ Films, V. G. Harris, S. A. Oliver, W. B. Nowak, C. Vittoria, R. J. Culbertson, W. T. Elam, K. H. Kim

Welville B. Nowak

As-deposited and annealed specimens of ion beam sputtered amorphous Co₇₄Fe₆B₁₅Si₅ thin films were examined to explore the correlation between changes in magnetic properties and atomic structure. Specimens were characterized magnetically, by traditional ac and dc techniques and structurally, via conversion-electron extended x-ray absorption fine structure analysis. Results show significant ordering of the higher order atomic shells around the transition metal ions well below the crystallization temperature. This ordering evolves into a body- centered-cubic configuration around both the Co and Fe ions. Increases in nearest neighbor peak positions in the EXAFS Fourier transforms were observed to correlate with increasing annealing temperatures. …


Magnetic And Microwave Properties Of Ion-Beam-Sputtered Amorphous Feₓco₈₀₋ₓb₁₅Si₅ Films, V. G. Harris, S. A. Oliver, W. B. Nowak, C. Vittoria Dec 2010

Magnetic And Microwave Properties Of Ion-Beam-Sputtered Amorphous Feₓco₈₀₋ₓb₁₅Si₅ Films, V. G. Harris, S. A. Oliver, W. B. Nowak, C. Vittoria

Welville B. Nowak

Magnetically soft amorphous films of FeₓCo₈₀₋ₓB₁₅Si₅ (x = 0, 6, 23, 40, 70, 80) were ion beam sputter deposited onto fused quartz for static and microwave magnetic characterization. Films ranged in thickness from 220 to 260 nm and were deposited at rates of 0.1-0.2 nm/s. Saturation magnetization, coercivity, and loop squareness values were extracted from hysteresis loops generated by a vibrating sample magnetometer. Ferromagnetic resonance measurements were taken using a 9.5-GHz cavity with the applied magnetic field both parallel and perpendicular to the plane of the film, yielding values for the g factor, anisotropy field, effective magnetization, and linewidth. Well …