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Anodisation Of Copper In Thiourea-And Formamidine Disulphide-Containing Acid Solution.: Part I. Identification Of Products And Reaction Pathway Jan 2001

Anodisation Of Copper In Thiourea-And Formamidine Disulphide-Containing Acid Solution.: Part I. Identification Of Products And Reaction Pathway

A.S. Md Abdul Haseeb

The anodic behaviour of copper in aqueous 0.5 M sulphuric acid containing different amounts of dissolved thiourea or formamidine disulphide was investigated at 298 K, combining data from electrochemical polarisation, chemical analysis, UV–vis spectroscopy, XPS and EDAX analysis, and structural information on copper–thiourea complexes. The main reactions depend on the applied potential and initial thiourea concentration. In the potential range −0.30≤E≤0.075 V (versus SCE), the electro-oxidation of thiourea to formamidine disulphide, the formation of Cu(I)–thiourea soluble complexes, and Cu(I)–thiourea complex polymer-like films, are the most relevant processes. The formation of this film depends on certain critical thiourea/copper ion molar concentration …