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Atomic Layer Deposition On Porous Materials: Problems With Conventional Approaches To Catalyst And Fuel Cell Electrode Preparation, Tzia Ming Onn, Rainer Küngas, Paolo Fornasiero, Kevin Huang, Raymond J. Gorte

Faculty Publications

Atomic layer deposition (ALD) offers exciting possibilities for controlling the structure and composition of surfaces on the atomic scale in heterogeneous catalysts and solid oxide fuel cell (SOFC) electrodes. However, while ALD procedures and equipment are well developed for applications involving flat surfaces, the conditions required for ALD in porous materials with a large surface area need to be very different. The materials (e.g., rare earths and other functional oxides) that are of interest for catalytic applications will also be different. For flat surfaces, rapid cycling, enabled by high carrier-gas flow rates, is necessary in order to rapidly grow thicker …