Open Access. Powered by Scholars. Published by Universities.®

Digital Commons Network

Open Access. Powered by Scholars. Published by Universities.®

Materials Science and Engineering

Electronic Theses and Dissertations

2006

Laser doping

Articles 1 - 1 of 1

Full-Text Articles in Entire DC Network

Laser Metallization And Doping For Silicon Carbide Diode Fabrication And Endotaxy, Zhaoxu Tian Jan 2006

Laser Metallization And Doping For Silicon Carbide Diode Fabrication And Endotaxy, Zhaoxu Tian

Electronic Theses and Dissertations

Silicon carbide is a promising semiconductor material for high voltage, high frequency and high temperature devices due to its wide bandgap, high breakdown electric field strength, highly saturated drift velocity of electrons and outstanding thermal conductivity. With the aim of overcoming some challenges in metallization and doping during the fabrication of silicon carbide devices, a novel laser-based process is provided to direct metallize the surface of silicon carbide without metal deposition and dope in silicon carbide without high temperature annealing, as an alternative to the conventional ion implantation, and find applications of this laser direct write metallization and doping technique …