Open Access. Powered by Scholars. Published by Universities.®
Articles 1 - 1 of 1
Full-Text Articles in Entire DC Network
Construction Of An Initiated Chemical Vapor Deposition (Icvd) Reactor And Deposition Of Polytetrafluoroethylene (Ptfe) Thin Films Using Perfluoro-1-Octanesulfonyl Fluoride As The Initiator, Edgar Kiprop Kosgey
Construction Of An Initiated Chemical Vapor Deposition (Icvd) Reactor And Deposition Of Polytetrafluoroethylene (Ptfe) Thin Films Using Perfluoro-1-Octanesulfonyl Fluoride As The Initiator, Edgar Kiprop Kosgey
MSU Graduate Theses
Initiated Chemical Vapor Deposition (iCVD) is a surface polymerization technique that is different from other traditional chemical vapor deposition (CVD) techniques. iCVD is carried under a vacuum without the use of solvents, therefore eliminating contaminations. An initiator and a monomer are metered into a vacuum reactor chamber. Inside the reaction chamber is an array of resistively heated filaments and a cooled substrate stage. Monomer species adsorb on to the cooled substrate surface underneath the filament array. The thermal energy from the resistively heated filaments breaks the bonds in the initiator molecule, generating free radicals. These generated free radicals chemisorb to …