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Platinum/Silica Thin Films By Chemical Vapor Deposition, Tyler Philip Martin
Platinum/Silica Thin Films By Chemical Vapor Deposition, Tyler Philip Martin
Electronic Theses and Dissertations
Composite thin films consisting of platinum and silica (SiO)2 have been fabricated by chemical vapor deposition (CVD). These films were studied for possible future use in enhancing the selectivity of sensors for the chemical warfare agent sarin. Chemical vapor deposition is a thin film growth technique in which precursor molecules are carried into a reactor and decomposed, often at high temperature, to produce a thin solid film. A new cold wall CVD reactor was built for this work. The platinum precursor used in this work was platinum acetylacetonate [Pt(acac)2] and the silica precursor was tetraethoxysilane (TEOS). It …